6 µm process

The 6 μm process is the level of MOSFET semiconductor process technology that was reached around 1974,[1][2] by leading semiconductor companies such as Toshiba and Intel.

Products featuring 6 μm manufacturing process

Toshiba TLCS-12, a microprocessor developed for the Ford EEC (Electronic Engine Control) system in 1973. It was manufactured on a 6 μm process, and went into mass production in 1975.[3]
Intel 8080 CPU launched in 1974 was manufactured using this process.[4]
Zilog Z80 launched 1976 was manufactured in 5 μm and 4 μm.[5]
The Television Interface Adaptor, the custom graphics and audio chip developed for the Atari 2600 in 1977. It was designed for a 6 μm process.[6]
The optical mouse demonstrated by Richard F. Lyon of Xerox in 1981 had a 5 μm NMOS chip.[7][8]
MOS Technology SID, a programmable sound generator developed for the Commodore 64 in 1982. It was designed for a 7 μm and 6 μm process.[6]
MOS Technology VIC-II, a video display controller developed for the Commodore 64 in 1982. It was designed for a 5 μm process.[6]

Mueller, S (21 July 2006). "Microprocessors from 1971 to the Present". informIT. Retrieved 11 May 2012.
Myslewski, R (15 November 2011). "Happy 40th birthday, Intel 4004!". TheRegister.
"1973: 12-bit engine-control microprocessor (Toshiba)" (PDF). Semiconductor History Museum of Japan. Archived from the original (pdf) on 27 June 2019. Retrieved 27 June 2019.
"Archived copy". Archived from the original on 27 April 2015. Retrieved 19 April 2015.{{cite web}}: CS1 maint: archived copy as title (link)
See Transistor count and Zilog Z80.
"Design case history: the Commodore 64" (PDF). IEEE Spectrum. Archived from the original (PDF) on 14 February 2015. Retrieved 1 September 2019.
Lyon, Richard F. (August 1981). "The Optical Mouse, and an Architectural Methodology for Smart Digital Sensors" (PDF). In H. T. Kung; Robert F. Sproull; Guy L. Steele (eds.). VLSI Systems and Computations. Computer Science Press. pp. 1–19. doi:10.1007/978-3-642-68402-9_1. ISBN 978-3-642-68404-3.
Lyon, Richard F. (2014). "The Optical Mouse: Early Biomimetic Embedded Vision". Advances in Embedded Computer Vision. Springer. pp. 3–22 (3). ISBN 9783319093871.

Preceded by 10 μm process	MOSFET semiconductor device fabrication process	Succeeded by 3 μm process

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Semiconductor device fabrication

MOSFET scaling (process nodes)
010 µm – 1971 006 µm – 1974 003 µm – 1977 1.5 µm – 1981 001 µm – 1984 800 nm – 1987 600 nm – 1990 350 nm – 1993 250 nm – 1996 180 nm – 1999 130 nm – 2001 090 nm – 2003 065 nm – 2005 045 nm – 2007 032 nm – 2009 022 nm – 2012 014 nm – 2014 010 nm – 2016 007 nm – 2018 005 nm – 2020
Future 003 nm ~ 2023 002 nm ~ 2024
Half-nodes Density CMOS Device (multi-gate) Moore's law Transistor count Semiconductor Industry Nanoelectronics